发明名称 PROCESS FOR REGENERATING CHEMICAL VAPOR DEPOSITED METAL PRECURSOR
摘要 PURPOSE: A process is provided to overcome inefficient use and reduction of chemical components of a CVD(chemical vapor deposition) process of copper by recollecting ligand reusing and re-synthesizing the CVD precursor of copper. CONSTITUTION: A by-product of a copper-ligand attachment is supplied to a process stream. The by-product of the copper-ligand attachment is cooled and condensed to separate Cu¬+2(1,1,1,5,5,5,- hexa fluoro - 2,4 - pentanedionate¬-1)2 from the process stream. Then, the by-product of the copper-ligand attachment contacts with a protonization operating agent selected from a group which is composed of sulphuric acid, hydrochloric acid, bromide hydracid, iodine hydracid, hydrogen sulfide, water, the mixture and so on. Then 1,1,1,5,5,5,- hexafluoro - 2,4 - pentanedione is re-collected.
申请公布号 KR20000047942(A) 申请公布日期 2000.07.25
申请号 KR19990055237 申请日期 1999.12.06
申请人 AIR PRODUCTS AND CHEMICALS INC. 发明人 NORMAN JOHN ANTHONY THOMAS;GODEN JOHN CAMERON;SHENJAKI YOSHIHIDE
分类号 B01J19/00;C07C45/85;C07C49/167;C07C49/92;C07F1/08;C07F7/08;C23C16/00;C23C16/44;H01L21/285;(IPC1-7):C23C16/00 主分类号 B01J19/00
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