| 摘要 |
PURPOSE: A method for compensating lithography alignment error is provided to compensate the horizontal error by using a simple horizontal translation of a mirror system. CONSTITUTION: A method for compensating lithography alignment error includes following steps. At the first step, the light from a light source is focused by a first mirror(21), and a second mirror(22) is provided to have the incident angle same to the angle of the first mirror. The mirror system includes the first and second mirrors. At the second step, a mask(27) to which the light from the mirror system is transferred is implemented on a mask stage(27). At the third step, a mask and wafer stages are configured so as to implement a wafer(26) which is exposed to the light penetrating the mask on the wafer stage. At the forth step, an extension/contraction component of a horizontal direction are compensated by controlling the run-out of the mirror system. At the fifth step, the mask and the wafer is scanned with respect to the light penetrating the mask.
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