发明名称 |
PRODUCTION OF INK JET HEAD, INK JET HEAD AND INK JET PRINTER |
摘要 |
PROBLEM TO BE SOLVED: To produce a fine nozzle of an ink jet head. SOLUTION: An etching-resistant pattern 2 is formed on an n-type silicon substrate 1 of having a direction of crystal plane (110) at a predetermined position and etching pits 3 are formed by the anisotropic etching of silicon. An electrode film 4 is formed on the rear surface of the silicon substrate 1 and this silicon substrate is immersed in an electrolyte soln. and inverse bias is applied to the silicon substrate to etch the same and etching advances to form etching grooves 5. The electrode film is removed and the rear surface of the silicon substrate is removed to form nozzles so as to pierce the etching grooves.
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申请公布号 |
JP2000203030(A) |
申请公布日期 |
2000.07.25 |
申请号 |
JP19990002928 |
申请日期 |
1999.01.08 |
申请人 |
SEIKO EPSON CORP |
发明人 |
USUI TAKAHIRO |
分类号 |
B41J2/045;B41J2/055;B41J2/135;(IPC1-7):B41J2/135 |
主分类号 |
B41J2/045 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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