| 摘要 |
PURPOSE: An organic non glare prevention polymer as shown in a formula 1 and 2 is used as a reflection prevention film in the ultrafine pattern forming process so that it eliminates CD changes arising from the lower film to produce stable ultrafine pattern of 64M, 256M, 1G, 4G and 16G DRAM. CONSTITUTION: In the polymer to be used as an organic prevention film shown in a formula 1, R1 is hydrogen, alkyl with C1-C4 or hydroxymethyl radical, R2, R3 are respectively hydrogen, methyl or ethyl radical, R4 is hydrogen, alkyl with C1-C4, hydroxy or hydroxymethyl radical, y is an integer that ranges from 1 to 5 and l, m are mole ratio that l:m is 0.1-0.9:0.1-0.9. A formula 2 is also a polymer used as an organic prevention film. |
