| 摘要 |
<p>A method and apparatus for continuously monitoring and recording parameters associated with pulse ion beam surface treatment (IBEST) processes or with other repetitively pulsed beam systems. The method includes measuring characteristics of an IBEST treatment process as pulsed waveforms, gating and integrating the measured pulsed waveforms over a predetermined period of time to produce a single value, converting the single value into an absolute digital value, and then using digital single value to calculate parameters indicative of the IBEST treatment process. The apparatus may include a gated integrator which receives and integrates the measured pulsed waveforms and a microprocessor which calculates the parameters indicative of the IBEST treatment process or of the performance of a general pulsed beam system. Alternatively, the apparatus may include a hard wired circuit which has a plurality of integrators and a series of circuit components for calculating the parameters indicative of the IBEST treatment process.</p> |
