发明名称 Integrated circuit having crack stop for interlevel dielectric layers
摘要 The propagation of a crack from the surface of the dielectric layer of an integrated circuit, through to the underlying circuit elements, is prevented by controlling the interface between the outermost, dielectric layer or layers and the inner layer or layers of the integrated circuit construction. The interface is weakened so that a crack that encounters the interface is caused to propagate in a horizontal manner, along the interface, preventing propagation of the crack in a direction that would be harmful to the manufactured article. This is preferably accomplished with multiple layers of material, each of which is made capable of redirecting (deflecting) the crack. Deflection of the crack, and arrest of the deflected crack along the interface, is made possible by controlling the fracture resistance of the interface.
申请公布号 US6091131(A) 申请公布日期 2000.07.18
申请号 US19980067905 申请日期 1998.04.28
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 COOK, ROBERT F.;GARCIA, EDUARDO;GRECO, NANCY A.;GRECO, STEPHEN E.;LEVINE, ERNEST N.
分类号 H01L23/532;(IPC1-7):H01L23/58 主分类号 H01L23/532
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