发明名称 Lead silicate based capacitor structures
摘要 A capacitor and method of making is described incorporating a semiconductor substrate, a bottom electrode formed on or in the substrate, a dielectric layer of barium or lead silicate, and a top electrode. A sandwich dielectric of a barium or lead silicate and a high dielectric constant material such as barium or lead titanate may comprise the dielectric. The silicate layer may be formed by evaporating and diffusing, ion implanting, or electroplating and diffusing barium or lead. The high epsilon dielectric constant material may be formed by sol gel deposition, metal organic chemical vapor deposition or sputtering. The invention overcomes the problem of a bottom electrode and dielectric layer which chemically interact to form a silicon oxide layer in series or below the desired dielectric layer.
申请公布号 US6090659(A) 申请公布日期 2000.07.18
申请号 US19990314409 申请日期 1999.05.19
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 LAIBOWITZ, ROBERT BENJAMIN;SHAW, THOMAS MCCARROLL
分类号 H01L27/04;H01L21/02;H01L21/316;H01L21/822;H01L21/8242;H01L21/8246;H01L27/105;H01L27/108;(IPC1-7):H01L29/76;H01L29/94;H01L31/062 主分类号 H01L27/04
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