发明名称 |
NITRIDE SYSTEM SEMICONDUCTOR DEVICE AND METHOD FOR GROWING SEMICONDUCTOR CRYSTAL |
摘要 |
PURPOSE: A nitride system semiconductor device and method for growing a semiconductor crystal is to prevent incoherence of lattice from being occurred at the boundary of two stacked layers. CONSTITUTION: A nitride system semiconductor device comprises a substrate, a BN system compound buffer layer formed on the substrate and containing boron and nitrogen atoms and a nitride system semiconductor crystal layer formed on the BN system compound buffer layer. A method for growing a semiconductor crystal comprises the steps of: providing a substrate; epitaxial growing a BN system compound on the substrate at a first temperature to form a buffer layer; and forming a nitride system semiconductor crystal layer on the buffer layer at a second temperature higher than the first temperature.
|
申请公布号 |
KR20000041281(A) |
申请公布日期 |
2000.07.15 |
申请号 |
KR19980057119 |
申请日期 |
1998.12.22 |
申请人 |
SAMSUNG ELECTRO MECHANICS CO., LTD. |
发明人 |
WON, JONG HAK;O, MYEONG SEOK |
分类号 |
C30B29/38;H01L21/205;H01L21/86;H01L33/06;H01L33/12;H01L33/32;H01L33/34;(IPC1-7):H01L21/205 |
主分类号 |
C30B29/38 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|