发明名称 NITRIDE SYSTEM SEMICONDUCTOR DEVICE AND METHOD FOR GROWING SEMICONDUCTOR CRYSTAL
摘要 PURPOSE: A nitride system semiconductor device and method for growing a semiconductor crystal is to prevent incoherence of lattice from being occurred at the boundary of two stacked layers. CONSTITUTION: A nitride system semiconductor device comprises a substrate, a BN system compound buffer layer formed on the substrate and containing boron and nitrogen atoms and a nitride system semiconductor crystal layer formed on the BN system compound buffer layer. A method for growing a semiconductor crystal comprises the steps of: providing a substrate; epitaxial growing a BN system compound on the substrate at a first temperature to form a buffer layer; and forming a nitride system semiconductor crystal layer on the buffer layer at a second temperature higher than the first temperature.
申请公布号 KR20000041281(A) 申请公布日期 2000.07.15
申请号 KR19980057119 申请日期 1998.12.22
申请人 SAMSUNG ELECTRO MECHANICS CO., LTD. 发明人 WON, JONG HAK;O, MYEONG SEOK
分类号 C30B29/38;H01L21/205;H01L21/86;H01L33/06;H01L33/12;H01L33/32;H01L33/34;(IPC1-7):H01L21/205 主分类号 C30B29/38
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