发明名称 |
METHOD FOR IMPROVING ALIGNMENT RATE BY CORRECTING THERMAL DIFFERENCE BETWEEN ELECTRON BEAM ROOM AND EXPOSURE CHAMBER |
摘要 |
PURPOSE: A method for improving an alignment rate by correcting a thermal difference between an electron beam room and an exposure chamber is provided to compensate alignment errors according to a thermal difference by using a white crown mask. CONSTITUTION: A method for improving an alignment rate by correcting a thermal difference between an electron beam room and an exposure chamber comprises the following steps. A white crown material is formed on a lower substrate. A white crown mask is formed by patterning a multitude of measuring location for measuring thermal variance of the substrate. The white crown mask is reserved in an electron beam room during a predetermined time. The white crown mask is inserted into an exposure chamber. A varied sized of the white crown mask is measured according to a predetermined interval within the exposure chamber. A difference between a maximum value and a minimum value of the measured data is obtained. A thermal difference between the electron beam room and the exposure chamber is obtained by using the difference. The exposure chamber is compensated according to the thermal difference.
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申请公布号 |
KR20000043243(A) |
申请公布日期 |
2000.07.15 |
申请号 |
KR19980059593 |
申请日期 |
1998.12.28 |
申请人 |
HYUNDAI ELECTRONICS IND. CO., LTD. |
发明人 |
UM, TAE SEUNG |
分类号 |
H01L21/027;(IPC1-7):H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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