发明名称 METHOD FOR IMPROVING ALIGNMENT RATE BY CORRECTING THERMAL DIFFERENCE BETWEEN ELECTRON BEAM ROOM AND EXPOSURE CHAMBER
摘要 PURPOSE: A method for improving an alignment rate by correcting a thermal difference between an electron beam room and an exposure chamber is provided to compensate alignment errors according to a thermal difference by using a white crown mask. CONSTITUTION: A method for improving an alignment rate by correcting a thermal difference between an electron beam room and an exposure chamber comprises the following steps. A white crown material is formed on a lower substrate. A white crown mask is formed by patterning a multitude of measuring location for measuring thermal variance of the substrate. The white crown mask is reserved in an electron beam room during a predetermined time. The white crown mask is inserted into an exposure chamber. A varied sized of the white crown mask is measured according to a predetermined interval within the exposure chamber. A difference between a maximum value and a minimum value of the measured data is obtained. A thermal difference between the electron beam room and the exposure chamber is obtained by using the difference. The exposure chamber is compensated according to the thermal difference.
申请公布号 KR20000043243(A) 申请公布日期 2000.07.15
申请号 KR19980059593 申请日期 1998.12.28
申请人 HYUNDAI ELECTRONICS IND. CO., LTD. 发明人 UM, TAE SEUNG
分类号 H01L21/027;(IPC1-7):H01L21/027 主分类号 H01L21/027
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