| 摘要 |
PURPOSE: A manufacturing method of the TMA device is provided to increase the manufacturing yield by reducing the manufacturing time and to improve the quality of the screen image by improving the horizontal characteristic of the mirror. CONSTITUTION: A device comprises an active matrix(100), a substrate(101), a first metal layer(135), a first protection layer(140), a second metal layer(145), a second protection layer(150), an etching preventing layer(155), a first sacrificial layer(160), and a supporting layer(170). A manufacturing method comprises a step of providing the active matrix including the first metal layer which has the drain pad extended from the drain of the transistor; a step of patterning and forming the first sacrificial layer on the upper part of the active matrix; a step of forming a first layer, a second layer, a lower electrode layer and upper electrode layer on the upper part of the active matrix; a step of forming the actuator including the first and second upper electrode, first and second electrodisplacives and the lower electrode by patterning the lower part electrode layer, the second layer and the upper part electrode layer sequentially; a step of forming a second sacrificial layer; and a step of forming a mirror on the upper part of the second sacrificial layer.
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