发明名称 HEAT-TREATING APPARATUS
摘要 PROBLEM TO BE SOLVED: To improve a response when a temperature is raised even while making a temperature distribution on an upper surface of a hot plate uniform. SOLUTION: The heat-treating apparatus mounts a substrate W on a hot plate 1, and heat-treats it. In this case, a heat pipe 7 is embedded in the plate 1, and a cooling groove 9 is provided. Thus, a thermal capacity of the plate 1 can be reduced, and a response when the temperature of the plate 1 is raised can be improved while holding the distribution of the upper surface of the plate 1 uniform. Particularly, since the groove 9 is arranged on the plate 1 having small thermal capacity, a response when the temperature is lowered can be extremely enhanced.
申请公布号 JP2000193376(A) 申请公布日期 2000.07.14
申请号 JP19980366953 申请日期 1998.12.24
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 MATSUSHITA MASANAO;SASADA SHIGERU
分类号 H01L21/324;F27B3/20;F27B3/24;F27D11/02;F28D15/02;(IPC1-7):F27D11/02 主分类号 H01L21/324
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