发明名称 VACUUM TREATING DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To quickly reduce pressure difference between the inside and outside of a holding jig and equalize the pressures to prevent the displacement. SOLUTION: This processing device is provided with a vacuum container 21, a rotatable and box-like holding jig 26 which is arranged inside the container 21 and is provided with a step part 26a holding a wafer 25 on its upper part, a heater 29 arranged under the stepped part 26a inside the holding jig 26, an inlet port 22 for introducing a gas into the container 21, and an exhaust port 23 for discharging the gas inside the container 21. The holding jig is provided with at least one hole 41, for reducing the pressure difference between the inside and outside of the holding jig 26.</p>
申请公布号 JP2000195803(A) 申请公布日期 2000.07.14
申请号 JP19980369496 申请日期 1998.12.25
申请人 SHIBAURA MECHATRONICS CORP 发明人 ONO YOKO
分类号 H01L21/683;B01J3/00;C23C16/44;H01L21/205;H01L21/68;(IPC1-7):H01L21/205 主分类号 H01L21/683
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