| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition capable of forming a pattern high in transparence and contrast. SOLUTION: The photosensitive resin composition is characterized by containing (1) a photosensitive agent having, in the structure, a methylene cross- linked system comprising 1,2-naphthoquinonediazide skeleton and >=2 phenolmethylsubstitution derivatives, (2) a polymer having hydroxyl groups and carboxyl groups or a combination of a polymer having hydroxyl groups and a polymer having carboxyl groups, (3) a cross-linking agent capable of cross-linking a hydroxyl groups with a carboxyl group, and (4) a solvent. |
