发明名称 SUBSTRATE MARK RECOGNITION MECHANISM
摘要 PROBLEM TO BE SOLVED: To enhance the accuracy of positioning a substrate in a component packaging apparatus. SOLUTION: An illuminator 22 casts light on a mark 4a for positioning provided on the surface of a substrate 4. An image pickup camera 21 picks up an image of the position of the mark 4a and recognizes it on the basis of a reflected light from the mark 4a of the light cast from the illuminator 22. A moving mechanism 23 for moving lamps 22a and 22b of the illuminator 22 is provided, and constitution is so made that at least either an angle θ formed by the surface of the substrate 4 at the position of the mark 4a and the illuminator 22 or a length of the distance between the mark 4a and the illuminator 22 can be changed. Even when the shape of the surface of the mark 4a is changed and no stable reflected light is obtained in a prescribed direction, accordingly, setting is made so that an increased quantity of reflected light can be obtained, by the control of positions of the lamps 22a and 22b by the moving mechanism 23. Thus, the probability of recognition of the positioning mark 4a can be enhanced in excellent contrast.
申请公布号 JP2000196298(A) 申请公布日期 2000.07.14
申请号 JP19980367690 申请日期 1998.12.24
申请人 SHIBAURA MECHATRONICS CORP 发明人 SHINODA YOSHIRO;MINAMIHAMA ETSURO
分类号 H05K13/08 主分类号 H05K13/08
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