Patterning method

摘要

In a layer structuring process using a mask, re-deposited layer material is removed with sonic assistance. A layer structuring process comprises (a) structuring a layer using a mask; (b) optionally removing the mask, preferably by ashing a lacquer mask; and (c) removing re-deposited layer material and the mask (if still present) with sonic assistance. Preferred Features: Sonic assistance is provided by an ultrasonic bath, a megasonic unit or a sonic liquid jet.