发明名称 SWITCHING STRUCTURE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To form an integration type switching mechanism in high density interconnection(HDI) circuit environment. SOLUTION: This switching structure is provided with an HDI plastic interconnection layer 12 laminated on a base 10 layer, a cavity 16 in the HDI plastic interconnection layer 12, at least one pattern of a shape memory alloy(SMA) layer 22 laminated on the HDI plastic interconnection layer and the cavity, at least one pattern of conductive layer on the SMA layer, a fixed contact pad installed on the base in the cavity, and a movable contact pad installed on a part of the pattern of SMA layer 22 in the cavity. A switch is connected and closed electrically through the contact of the movable contact pad to the fixed contact pad when it is in a first stabilized position owing to the deformation by energizing of the pattern of SMA layer. IN a second stabilized position, the contact pad does not come in contact and an open switch is formed.
申请公布号 JP2000190298(A) 申请公布日期 2000.07.11
申请号 JP19990302120 申请日期 1999.10.25
申请人 GENERAL ELECTRIC CO <GE> 发明人 KORNRUMPF WILLIAM P;WOJNAROWSKI ROBERT J
分类号 B81B3/00;B81C1/00;H01H1/00;H01H37/32;H01H61/00;H01H61/01;(IPC1-7):B81B3/00 主分类号 B81B3/00
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