发明名称 |
Method and structure for protecting a neighbouring area adjacent to an area to be etched and method for forming a fuse |
摘要 |
<p>A method and apparatus for protecting a neighboring area that is adjacent to a first area that is to be etched. The method includes creating a guard cell substantially surrounding the first area, but excluding the neighboring area. The guard cell is formed of a material that is substantially selective to the etch process subsequently employed to etch within the first area. After the guard cell is formed, an etch is performed within the first area, while the guard cell prevents etching of the neighboring are outside the guard cell. <IMAGE></p> |
申请公布号 |
EP0942462(A3) |
申请公布日期 |
2000.07.05 |
申请号 |
EP19990103818 |
申请日期 |
1999.02.27 |
申请人 |
SIEMENS AKTIENGESELLSCHAFT |
发明人 |
BRINTZINGER, AXEL CHRISTOPH;RAMACHANDRAN, RAVIKUMAR;SRINIVASAN, SENTHIL KUMAR |
分类号 |
H01L21/302;H01L21/311;H01L23/525;(IPC1-7):H01L21/311 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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