| 摘要 |
PURPOSE: A gas supplying apparatus used for a manufacture of a semiconductor device is provided to filter out impurities in a counterflow gas and thereby to reduce contamination of a chamber and a wafer. CONSTITUTION: A gas supplying apparatus includes a gas supply unit which contains a gas therein, and a gas supply pipe which supplies the gas in the gas supply unit to a chamber. The apparatus further includes a pump for pumping the gas out of the gas supply unit and a filter for removing impurities from the gas. In particular, the apparatus further includes an impurity gathering unit(107) disposed between the filter and the chamber through the gas supply pipe. The gathering unit(170) has a body(108) which is integrated with the gas supply pipe(102a,102b) but has a greater diameter, and a tapering pipe(109) which is equipped inside the body(108) and narrows toward the chamber. That is, the tapering pipe(109) on the filter side has the same diameter than the gas supply pipe(102a), however that on the chamber side has a smaller diameter than the opposite gas supply pipe(102b). Therefore, when the gas flows backward from the chamber, impurities in the counterflow gas are almost gathered in a space between the body(108) and the tapering pipe(109).
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