发明名称 |
Plasma processing apparatus with a dielectric body in the waveguide |
摘要 |
Dielectric bodies are arranged in waveguide portions for passing microwave radiation and for holding a plasma generating chamber 25 at a vacuum. The dielectric bodies are arranged to intersect at least an electron cyclotron resonance area of the waveguide portions. A tip end portion of the dielectric bodies at a side of the plasma generating chamber are positioned toward at a side of the plasma generating chamber from an intermediate portion in an axial direction length of a first permanent magnet which is arranged by enclosing an outer periphery of the waveguide portions, and a tip end portion of the dielectric bodies at a side of the plasma generating chamber is substantially consistent with an inner face of the plasma generating chamber.
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申请公布号 |
US6084356(A) |
申请公布日期 |
2000.07.04 |
申请号 |
US19980084911 |
申请日期 |
1998.05.28 |
申请人 |
HITACHI, LTD. |
发明人 |
SEKI, HIROFUMI;ICHIMURA, SATOSHI;TAKEMORI, SATOSHI;SETOYAMA, EIJI;ISHIGURO, KOUJI;MOCHIZUKI, YASUHIRO;OKADA, SENSUKE;MURAKAMI, HAJIME |
分类号 |
H05H1/46;C23C16/50;C23C16/511;C23F4/00;H01J37/32;H01L21/205;H01L21/302;H01L21/3065;H01L21/31;(IPC1-7):H05H1/46 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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