发明名称 Plasma processing apparatus with a dielectric body in the waveguide
摘要 Dielectric bodies are arranged in waveguide portions for passing microwave radiation and for holding a plasma generating chamber 25 at a vacuum. The dielectric bodies are arranged to intersect at least an electron cyclotron resonance area of the waveguide portions. A tip end portion of the dielectric bodies at a side of the plasma generating chamber are positioned toward at a side of the plasma generating chamber from an intermediate portion in an axial direction length of a first permanent magnet which is arranged by enclosing an outer periphery of the waveguide portions, and a tip end portion of the dielectric bodies at a side of the plasma generating chamber is substantially consistent with an inner face of the plasma generating chamber.
申请公布号 US6084356(A) 申请公布日期 2000.07.04
申请号 US19980084911 申请日期 1998.05.28
申请人 HITACHI, LTD. 发明人 SEKI, HIROFUMI;ICHIMURA, SATOSHI;TAKEMORI, SATOSHI;SETOYAMA, EIJI;ISHIGURO, KOUJI;MOCHIZUKI, YASUHIRO;OKADA, SENSUKE;MURAKAMI, HAJIME
分类号 H05H1/46;C23C16/50;C23C16/511;C23F4/00;H01J37/32;H01L21/205;H01L21/302;H01L21/3065;H01L21/31;(IPC1-7):H05H1/46 主分类号 H05H1/46
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