Method of reducing carbon incorporation into films produced by chemical vapor deposition involving organic precursor compounds

摘要

In one aspect, a deposition method comprises the following steps: a) forming a layer on a semiconductive substrate, the layer comprising predominately an inorganic material, the layer also comprising incorporated carbon; b) generating a plasma adjacent the layer from a component gas, the component gas comprising Ar, and c) utilizing the plasma to remove the carbon from the layer.