发明名称 X-ray illumination system and X-ray exposure apparatus
摘要 An X-ray illumination system includes first and second X-ray mirrors for reflecting a synchrotron radiation beam, sequentially, a driving system for changing at least one of position and attitude of each of the first and second X-ray mirrors, a first measuring system for detecting a synchrotron radiation beam impinging on the first X-ray mirror, a second measuring system for measuring at least one of position and attitude of the first X-ray mirror with respect to a predetermined reference, or at least one of relative position and relative attitude between the first and second X-ray mirrors, a first control system for controlling drive of the first X-ray mirror on the basis of the measurement by the first measuring system, and a second control system for controlling drive of the second X-ray mirror on the basis of the measurement by the second measuring system.
申请公布号 US6081581(A) 申请公布日期 2000.06.27
申请号 US19980114525 申请日期 1998.07.13
申请人 CANON KABUSHIKI KAISHA 发明人 HASEGAWA, TAKAYUKI
分类号 G21K5/02;G03F7/20;G21K1/06;H01L21/027;H05H13/04;(IPC1-7):G21K1/00 主分类号 G21K5/02
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