| 摘要 |
PURPOSE: A method for producing solid camera element is provided to equalize the thickness of the insulator layers between a first polygate and a second polygate, and to prevent the breakdown voltage between the first polygate and the second polygate from being lowered. CONSTITUTION: A method for producing solid camera element includes first thru seventh steps. At the first step, an oNO(oxide/nitride/oxide) layer(32) is formed on the board(31). At the second step, a plurality of first polygates(33) are formed on the ONO layer(32). At the third step, an oxidation material is formed on the first polygate. At the forth step, a first oxidation layer(35) is formed on the oxidation material. At the fifth step, a plurality of second polygates(36) are formed on the first oxidation layer(35) adjacent to the first polygate(33). At the sixth step, a second oxidation layer(37) is formed on the second polygate(36). At the seventh step, a plurality of third polygates(38) are formed on the first and the second oxidation layers(35,37).
|
