| 摘要 |
PURPOSE: An allyl-derived precursor is provided for allyl-derived ligand precursor low resistivity and high adhesive, and to be stable at room temperatures and sufficiently volatile at higher temperatures. CONSTITUTION: A Cu(hfac) allyl-derived ligand precursor has been provided. The ligand includes group consisting of alkyl, phenyl, trialkylsilane, trialkoxysilane, halodialkylsilane, dihaloalkylsilane, trihalosilane, triphenylsilane, alkoxyl, halogen, chloroformate, cyanide, cycloalkyl, cycloalkylamine, alkylether, isocyanate, and pentafluorobenzene. Examples of the allyl-derived ligand precursors have proved to be stable at room temperatures, and sufficiently volatile at higher temperatures.
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