| 摘要 |
PROBLEM TO BE SOLVED: To provide uniform illuminance by laminating a hole carrying layer and a light-emitting layer or laminating a hole-carrying layer, a light-emitting layer, and an electron transparent layer in this order for forming a thin film layer and setting a film thickness deviation to be a specific value or less. SOLUTION: An anode 2 made of ITO and formed into a film on a glass substrate 1 by means of a sputtering method is put inside a chamber dedicated to form a thin film layer, and a hole transport layer 3a made of TPD, a light- emitting layer 3b prepared by mixing a minute amount of quinacridone with Alq3, and Alq3 electron transport layer 3c are formed and laminated into a lamination layer 3 through a vacuum deposition method. Then, a Mg-Ag alloy negative electrode 4 is similarly formed into a film through a vacuum deposition method. In this way, the film thickness deviation of the thin film layer 3 can be set to 5% or less. When a current is let flow with the anode 2 is set as 'positive' and the cathode 4 is set as 'negative', light with the substantially same spectrum as a fluorescent spectrum of a light-emitting material is emitted from the light-emitting layer 3b and discharged via the substrare 1. A luminance deviation and an illuminance deviation of a line source provided with the thin film layer all become 15%. |
