| 摘要 |
PROBLEM TO BE SOLVED: To provide an antireflection film which has excellent antireflection effect and contamination resistance and which can be formed by the photosetting reaction even in the presence of oxygen by hardening a photosetting compsn. containing a specified compd. and a photoacid producing agent component with light. SOLUTION: This antireflection film is formed by hardening a photosetting compsn. containing at least one compd. selected from a group of hydrolytic silane compds. expressed by the formula of (R1)PSi(X)4-P, their hydrolyzed products and condensed products, and a photoacid producing agent component with light. In the formula, R1 is a 1-12C nonhydrolyzable org. group, X is a hydrolyzable group, and p is an integer of 0 to 3. The antireflection film can be formed even in air without influenced by oxygen, and an excellent antireflection effect and contamination resistance of the obtd. antireflection film can be obtd. |
