发明名称 MECHANISMS FOR MAKING AND INSPECTING RETICLES
摘要 <p>A reusable circuit design (250, 300) for use with electronic design automation EDA tools in designing integrated circuits is disclosed, as well as reticle inspection and fabrication methods that are based on such reusable circuit design. The reusable circuit design (250, 300) is stored on a computer readable medium and contains an electronic representation of a layout pattern (260, 258, 302) for at least one layer of the circuit design on an integrated circuit. The layout pattern includes a flagged critical region which corresponds to a critical region (256, 304) on a reticle or integrated circuit that is susceptible to special inspection or fabrication procedures. In one aspect of the reusable circuit design, the special analysis is performed during one from a group consisting of reticle inspection, reticle production, integrated circuit fabrication, and fabricated integrated circuit inspection.</p>
申请公布号 WO2000036525(A2) 申请公布日期 2000.06.22
申请号 US1999030240 申请日期 1999.12.17
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