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发明名称
A method for forming a metal interconnection in a semiconductor device
摘要
申请公布号
EP0898308(A3)
申请公布日期
2000.06.21
申请号
EP19980302581
申请日期
1998.04.02
申请人
SAMSUNG ELECTRONICS CO., LTD.
发明人
YOON, MEE-YONG;LEE, SANG-IN
分类号
H01L21/285;H01L21/28;H01L21/3205;H01L21/768;(IPC1-7):H01L21/768
主分类号
H01L21/285
代理机构
代理人
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