| 摘要 |
<p>PROBLEM TO BE SOLVED: To automatically and accurately measure the distribution of phase difference. SOLUTION: This producing method includes the following processes. The processes are: a mask pattern drawing process to draw the original mask pattern on a light-transmitting substrate 101, a measurement pattern arranging process to arrange plural patterns for the measurement of light transmittance on the original mask pattern in piles on a phase shift mask at an equal interval, an etching process to complete partial etching of the light-transmitting substrate by using the pattern for the measurement of transmittance in such a manner that the phase difference of projected light transmitting through adjacent transparent regions is almost 180 degree from each other, and a removing process of the measurement pattern after the etching process so as to selectively remove the pattern for the measurement of the light transmittance which has possibility to change the profile and/or transmittance of the original pattern.</p> |
