FORMING METHOD OF CATHODE CURRENT LIMITING HIGH RESISTANCE VALUE RESISTANCE IN FIELD EMISSION DISPLAY

摘要

PROBLEM TO BE SOLVED: To easily and suitably mass-produce a high resistance value resistance, and to form the high resistance value resistance together with an ohmic contact when necessary by forming an emitter site on a conductive area of a baseplate, and arranging a contact part connected to the conductive area in a resistance layer accumulated on the baseplate. SOLUTION: A high resistivity material is accumulated on a baseplate 12 to form a high resistance value resistance 32. The resistance 32 is insulated from the baseplate 12 by a thin insulating layer 40. The resistance 32 is electrically connected to an N-tank conductive area 16 of an emitter site 14 by a first contact part 38 to be connected to an interconnector 34 by a second contact part 39. The interconnector 34 is a conductive film to be electrically connected to the other circuit component of a FED pixel 10. A via 50 is formed in a multilevel oxidation layer 36, and the interconnector 34 is connected to the high resistance value resistance 32. Resitivity of the resistance 32 is a function of the dimension together with resistivity of a material.