| 摘要 |
PROBLEM TO BE SOLVED: To efficiently project and transfer a group of point-symmetric patterns onto a substrate by using a small number of mask patterns to produce a diffraction optical device. SOLUTION: In the production of a group of point-symmetric patterns by projecting a reticle pattern on a substrate and exposing, it the substrate is divided into plural regions in the circumferential direction, and the substrate is successively rotated and exposed by using the same reticle pattern for each region in the circumferential direction. In this method, a group of alignment marks including at least one kind of alignment mark corresponding to the rotation angle of the substrate arranged outside of the exposure region of the substrate is used.
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