| 摘要 |
PURPOSE: A chemical supply method used in semiconductor wafer coating equipment is provided to consistently supply the chemical of suitable amount at suitable time and exclude the usage of a select valve to prevent a safety accident. CONSTITUTION: In a first decision step, it is decided whether the chemical amount within a first tank is greater the amount used in one time by the semiconductor wafer coating equipment or not. In a second decision step, it is decided whether the semiconductor wafer coating equipment is stopped or not. A first valve between the first tank and the semiconductor wafer coating equipment is closed and the semiconductor wafer coating equipment is operated if the first and second decision steps are satisfied. At the same time, a second valve between the semiconductor wafer coating equipment and a second tank is opened.
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