| 摘要 |
PURPOSE: A method for removing rinse liquid is provided to decrease or remove the residual rinse liquid for maintaining a resist pattern after a spin dry operation. CONSTITUTION: A method for removing rinse liquid includes a first to a fifth step. At the first step, a resist is applied on the semiconductor board(21). At the second step, a resist pattern(23) is formed by patterning the resist. At the third step, the resist pattern(23) is rinsed. At the forth step, The resist pattern(23) is spinned. At the fifth step, The resist pattern(23) is spinned and dried. Further, the third step and the fifth step are performed in the same chamber(10).
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