APPARATUS FOR REMOVING PARTICLES ON CHUCK OF CVD EQUIPMENT

摘要

PURPOSE: An apparatus for removing particles on a chuck of CVD equipment is provided to remove the particles formed on a top surface of a chuck to prevent the particles to be attached to a rear surface of a wafer, thereby excluding a process for purging the rear surface of the wafer. CONSTITUTION: An on/off port(10) is formed on one side of a chamber(1') of the CVD equipment. A particles absorbing plate(12) is driven by a driver such as a robot arm(11) to move to a chuck(2') within the chamber(1') through the on/off port(10), and is charged by DC voltage to be mounted in outside of the chamber(1') near the on/off port(10). A particles absorbing plate storage room(14) is formed to surround particles absorbing plate(12) to be opened to the chamber(1') through the on/off port(10), and is connected to a pump(5) via a pumping line(13). DC voltage can be applied to a top surface of the chuck(2') to charge the chuck(2').