DEVICE AND METHOD FOR TREATING POLISHING PADS, ESPECIALLY POLISHING CLOTHS

摘要

The invention relates to a device and a method for treating a polishing pad, especially a polishing cloth for polishing wafers. The inventive device has a treatment disk which is mounted on a carrying device. Said treatment disk has a base layer on which diamond pieces set in metal are arranged, and is brought into contact with the polishing pad for treatment of the same by means of the carrying device. The invention also relates to a method for treating the polishing pads.