| 摘要 |
PROBLEM TO BE SOLVED: To obtain an antireflection material which exhibits a high surface hardness, a high scratch resistance, an excellent durability, a low reflectance, a high light transmission, a good adhesion to a transparent material, and an excellent film-forming capability by using at least two fluoromonomers. SOLUTION: At least two fluoromonomers selected from among monomers represented by formulas I to V are used, provided at least two of the fluoromonomers used are selected from different groups of formulas I to V. In the formulas, X1 and X2 are each H or methyl; Rf is a 2-12C fluoroalkyl group having at least three fluorine atoms or a 4-12C cyclofluoroalkyl group having at least four fluorine atoms; and Y and Z are each 2-12C alkyl, 4-12C cycloalkyl, 2-12C fluoroalkyl, or 4-12C cyclofluoroalkyl provided at least either Y or Z contains a fluorine atom or atoms. The fluoromonomers, together with a photopolymerizable monomer, are applied to a transparent substrate and polymerized by the irradiation with light to form an antireflection layer. |
