Optical device, exposure system, and laser beam source, and gas feed method, exposure method, and device manufacturing method,申请号AU19990048008-传众专利搜索

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发明名称	Optical device, exposure system, and laser beam source, and gas feed method, exposure method, and device manufacturing method
摘要
申请公布号	AU4800899(A)	申请公布日期	2000.06.13
申请号	AU19990048008	申请日期	1999.07.27
申请人	NIKON CORPORATION	发明人	KIYOSHI MOTEGI;SATORU OSHIKAWA
分类号	G03F7/20	主分类号	G03F7/20
代理机构		代理人
主权项
地址

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