发明名称 POLISHING CLOTH FOR CHEMIMECHANICAL POLISHING AND CHEMIMECHANICAL POLISHER USING SAME
摘要 PROBLEM TO BE SOLVED: To provide a polishing cloth which can polish each area of the work to be polished uniformly. SOLUTION: The surface facing to the work to be polished of a polishing cloth 20 has a flat plate 21, lots of columnar projections 22 formed on this flat plate 21 and grooves 23 bored on the flat plate 21. Therefore, steps formed by the surface of the flat plate 21 are existing between the top surfaces of the columnar projections 22 for making a polishing surface and the bottoms of the grooves 23. Thereby, the surface of the polishing cloth 20 is formed in multi-steps structure. Thereby, as the polishing agent can be supplied favorably to the area where the work to be polished is pressed, each area of the work to be polished can be polished uniformly.
申请公布号 JP2000158327(A) 申请公布日期 2000.06.13
申请号 JP19980342775 申请日期 1998.12.02
申请人 ROHM CO LTD 发明人 SAKAMOTO TATSUYA;MATSUMOTO MUNEYUKI
分类号 B24B37/20;B24B37/24;B24B37/26;B24D13/14;H01L21/304;H01L21/306 主分类号 B24B37/20
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