| 摘要 |
PROBLEM TO BE SOLVED: To reduce stained particles stuck to an inner wall of a quartz chamber while the whole of a wafer is heated uniformly at a constant temperature in a lamp anneal system. SOLUTION: While light and heat is fed from a halogen lamp 12, and a wafer 13 located at a given position in a quartz chamber 11 is heated. A process gas is fed into the quartz chamber 11 through inlet openings 14a and 14b. The process gas through the inlet openings 14a is fed through a gas introducing part 16a and spouted all over an upper face of a wafer 13 through a plurality of spouting holes 17 at the gas introducing part 16a. Similarly, the process gas fed through the inlet opening 14b is fed through a gas introducing part 16b and spouted all over a lower face of the wafer 13 through a plurality of spouting holes 17.
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