发明名称 Two-dimensional to three-dimensional VLSI design
摘要 An apparatus and a method for producing a mask, which was derived using two-dimensional design tools, for imparting circuit designs directly on a three-dimensional surface. The method for creating the mask includes the steps of creating a two dimensional design with at least one element, establishing a location coordinate for the element using a two-dimensional coordinate system, converting the location coordinate for the element into a spacial coordinate for the element using a three-dimensional spacial coordinate system, converting the spacial coordinate for the element into a positional coordinate, and generating the mask using the positional coordinate. The apparatus for implementing three-dimensional designs using a mask, which is generated from a two-dimensional design, includes a light source and an elliptical mirror. The elliptical mirror has two focal points so that the elliptical mirror can focus a beam of light onto the three-dimensional surface.
申请公布号 US6071315(A) 申请公布日期 2000.06.06
申请号 US19980113731 申请日期 1998.07.10
申请人 BALL SEMICONDUCTOR, INC. 发明人 RAMAMURTHI, RAM;TAKEDA, NOBOU
分类号 G03F1/08;G03F1/14;G03F7/24;G06F17/50;H01L21/027;H01L29/06;(IPC1-7):G06F17/50 主分类号 G03F1/08
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