发明名称 Process for pattern searching and a device for positioning of a mask to a workpiece
摘要 A process for pattern searching in which position coordinates of patterns on a workpiece with a rough surface can be determined automatically and with high precision, and a device for executing the process are achieved by CCD cameras and the like picking up patterns which are located on a workpiece with a rough surface, and which are formed only by intersecting lines, and by a storage means storing light-dark signals. Furthermore, according to the invention, the image signals are integrated in directions which are each parallel to the lines of the patterns, by which integral signals SIGMA Xn, SIGMA Yn are determined. By integrating the image signals, the images which are formed as a result of surface roughness are averaged. The integration signals clearly yield boundary positions of the patterns, and by differentiating these integral signals, the pattern positions are determined based on their peak positions.
申请公布号 US6072915(A) 申请公布日期 2000.06.06
申请号 US19970782330 申请日期 1997.01.13
申请人 USHIODENKI KABUSHIKI KAISHA 发明人 TANAKA, YONETA
分类号 G01B11/00;G03F9/00;G06T1/00;G06T7/60;(IPC1-7):G06K9/36 主分类号 G01B11/00
代理机构 代理人
主权项
地址
您可能感兴趣的专利