| 摘要 |
An apparatus and method are provided for effectively and controllably vaporizing solid material, in general, and specifically, solid precursor material for chemical phase deposition processes. The apparatus includes a hollow container member, capable of retaining solid material and having a longitudinal axis passing through a substantially open first end, that is reciprocally injected at a controlled rate through a heater capable of vaporizing the solid material so that vaporized material passes through the first end along the longitudinal axis of the container member and into the reaction chamber. Preferably, the apparatus includes a hollow body capable of pressure containment that is in fluid communication with the reaction chamber and an rod-shaped injector slidably disposed through the hollow body suitable for injecting the container member through the body and the injector is driven external to the body using a stepper motor. It is also preferred that the body have first and second sections consisting of a load lock and a tubing member, respectively, that can be isolated through the use of a gate valve. Preferably, the container member also includes a removable cap that is capable of sealing and retaining solid CVD precursor material in the container member and a moveable arm is provided through the load lock for engaging the cap to allow for its removal from the container member. Preferably, the container member is horizontally injected through a heater chamber into an inlet port in a reaction chamber.
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