发明名称 |
Method and system for patterning to enhance performance of a metal layer of a semiconductor device |
摘要 |
A method and system for patterning a metal layer of a semiconductor device is disclosed. The method and system includes providing a material with an antireflective low dielectric constant hard mask layer (antireflective low k hard mask layer) on top of the metal layer, and providing a photoresist pattern on top of the anti-reflective low k hard mask layer. The method and system further includes etching of the anti-reflective low k hard mask layer and etching of the metal layer, wherein the photoresist is removed but the anti-reflective low k hard mask layer remains. In a preferred embodiment, the mask layer can also be applied at low temperatures (i.e., >300 DEG ) to ensure that the physical properties of the integrated circuit are not affected. Finally, the low k material does not have to be removed after processing. Accordingly, through the use of an anti-reflective low k hard mask layer, the metal patterning can be more effectively accomplished in a deep submicron process, particularly a process that is required for 0.18 microns or smaller technologies.
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申请公布号 |
US6071824(A) |
申请公布日期 |
2000.06.06 |
申请号 |
US19970937634 |
申请日期 |
1997.09.25 |
申请人 |
ADVANCED MICRO DEVICES, INC. |
发明人 |
SINGH, BHANWAR;GUPTA, SUBHASH;VICENTE, MUTYA;CHEN, SUSAN HSUCHING |
分类号 |
G03F7/09;H01L21/027;H01L21/3213;(IPC1-7):H01L21/00 |
主分类号 |
G03F7/09 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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