| 摘要 |
PROBLEM TO BE SOLVED: To provide the high barrier properties of a gaseous and liquid substance and also the mechanical stability by vapor-depositing a transparent monolayer with a specific layer thickness containing one or more kinds of a metal oxide compound, on the first monolayer of a transparent silicon oxide layer with specific stoichiometric composition and layer thickness out of two or more monolayers formed by a plasma- assisted gas phase sedimentation process. SOLUTION: The barrier layer system 3 is composed of two monolayers 4, 5 deposited on a plastic base material 2 by a (plasma-chemical-steam-sedimentation) coating process, that is, substantially a 1<=x<=2 silicon oxide SiOx deposition layer 4 and a closed second layer 5 of aluminum oxide. The silicon oxide SiOx of the first deposition layer 4 is deposited within a stoichiometric value range of x<2 with <500 mm layer thickness. The AlyOz layer 5 of the second monolayer (a barrier layer) deposited on the base material 2 is vapor-deposited with a 1.5<=y<=2, 2<=z<=3 stoichiometric composition and <500 nm layer thickness. Thus the thin SiOx layer 4 is elastically deformable to an external mechanical effect and free from any fissure and separation from the base material 2 and the second monolayer 5 shows high barrier properties.
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