发明名称 SHADOW MASK AND FABRICATING METHOD THEREOF
摘要 PURPOSE: A shadow mask and a fabricating method thereof are provided to improve the mechanical strength of the shadow mask by locating a polygonal big hole to collide with the direction of an electron beam, and for the electron beam to penetrate through the shadow mask easily according to the position of penetration holes. CONSTITUTION: A fabricating method for a shadow mask includes first through six steps. The first step is to form penetration holes at the center of two diagonals of almost rectangular iron plate with different penetration diameters at front and back sides of the iron plate. The two different penetration diameters denote a big hole and a small hole, respectively. The second step is to form the big hole with its size and shape varying from the center to edge and with its shape of two different sized circles connected together. The third step is to form a small circular hole in the center of the big hole. The forth step is to apply a sensitive material on the shadow mask with the big and small holes formed within. The fifth step is to expose and develop both surface of the shadow mask with the applied sensitive material. The sixth step is to etch both sides of the developed iron plate simultaneously.
申请公布号 KR20000032106(A) 申请公布日期 2000.06.05
申请号 KR19980048461 申请日期 1998.11.12
申请人 LG MICRON CO., LTD. 发明人 PARK, HO YOUNG
分类号 H01J29/02;H01J9/02;(IPC1-7):H01J29/02 主分类号 H01J29/02
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