Co-Ti ALLOY SPUTTERING TARGET AND MANUFACTURING METHOD THEREOF

摘要

A method of manufacturing a Co-Ti alloy sputtering target containing not more than 100 ppm of oxygen and having a grain size of not larger than 50 mu m, comprising forming a Co-Ti alloy ingot by vacuum-melting and casting a Co-Ti alloy containing 0.5 to 20 wt.% of Ti, and then hot-working the ingot. The Co-Ti alloy sputtering target containing the above small amount oxygen is useful for forming a sputtering thin film which is excellent in film-forming uniformity and has few particles.