| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate rotating/drying device wherein a substrate is entirely dried efficiently in a short time by effectively removing water droplets sticking to the surface of a substrate according to their behavior. SOLUTION: A chamber 10 and a substrate holder 12 provided in the chamber 10 for holding a plurality of substrates are provided. Here, means 22, 24, and 26 which depressurize the chamber 10 while introduce a dried gas into the chamber 10, a means 16 which rotates the substrate holder 12 at high speed, and a means 16 which introduces/discharges a large amount of dried gas into the chamber 10 while rotating the substrate holder at low speed, are provided.
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