发明名称 ELECTROLESS GOLD PLATING METHOD AND ELECTROLESS GOLD PLATING SOLUTION USED THEREFOR
摘要 PROBLEM TO BE SOLVED: To provide an electroless gold plating soln. forming a gold plating film extremely excellent in adhesion between the substitution gold plating film to be formed and a base metal film selected from the groups of nickel, cobalt, palladium and alloys contg. these metals and to provide a method of executing electroless gold plating treatment by using it. SOLUTION: As essential components, this soln. contains the following (a) to (c): (a) a water soluble gold compd., (b) a complexing agent which stabilizes gold ions into a plating soln. but substantially does not dissolve nickel, cobalt or palladium and (c) a gold precipitation inhibitor capable of suppressing the partial and excessive etching of the base metal generated at the time of executing gold plating by substitution reaction with the base metal.
申请公布号 JP2000144441(A) 申请公布日期 2000.05.26
申请号 JP19980330199 申请日期 1998.11.05
申请人 NIPPON RIIRONAARU KK 发明人 OTA YASUO;TAKIZAWA YASUSHI;ENOMOTO HARUKI
分类号 C23C18/42;(IPC1-7):C23C18/42 主分类号 C23C18/42
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