发明名称 METHOD FOR MANUFACTURING PRESSURE SENSOR
摘要 PURPOSE: A method for manufacturing a pressure sensor is to prevent metallic film from undercutting by etchant, thus obtaining improvements of both process reliance and yield. CONSTITUTION: A method for manufacturing pressure sensor comprises the steps of: forming a multilayered metallic film(202) on the back face of a silicone wafer(200); applying a first mask pattern onto the metallic film to be exposed some center portions of the metallic film; eroding the exposed portions of metallic film using etchant so as to be exposed some surface of silicone wafer; removing the first mask pattern from the silicone wafer; applying a second mask pattern(206) onto some back face of the silicone wafer to be surrounded upper and side faces of the metallic film; and eroding the exposed back face of the silicone wafer using etchant to form a diaphragm.
申请公布号 KR20000028198(A) 申请公布日期 2000.05.25
申请号 KR19980046358 申请日期 1998.10.30
申请人 KOREA ELECTRONICS CO., LTD. 发明人 CHOI, YEON SIK;SONG, JONG GYU;LEE, WON O;LEE, GEUN HYEOK;PARK, JUNG EON
分类号 H01L29/84;(IPC1-7):H01L29/84 主分类号 H01L29/84
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