Wafer cleaning system with progressive megasonic wave

摘要

Improved megasonic cleaning is obtained by use of an apparatus containing a plurality of transducers arranged to transmit a progressive megasonic wave through a liquid containing a planar surface of an object. The progression of the wave is preferably such that particles are carried by the wave toward the toward the edge of the wafer. The processes and apparatus are especially useful for cleaning wafers in the course of manufacturing integrated circuit chips.