| 摘要 |
PROBLEM TO BE SOLVED: To make it possible to manage the dimensions of magneto-resistive elements(MR elements) in accordance with the shapes or sizes of patterns for process monitor appearing on a polished surface when more precisely obtaining the dimensions of the MR element by polishing. SOLUTION: The pattern 8 for process monitor formed to change the dimensions or shapes appearing on the polished surface in correspondence to the abrasion wear are formed in prescribed positional relations with the MR elements 6. The patterns 8 for process monitor are formed by ion milling processing with the same stage as the stage for previously forming the film having an ion milling rate higher than that of the MR elements 6 to a film thickness thicker than the film thickness of the MR elements 6 and patterning the MR elements 6. The shapes of the patterns 8 for process monitor may be formed to a triangular shape, inverted triangular shape, etc., in addition to comb shapes varying in respective tooth lengths.
|
